Authors: Cubillos, GI; Bethencourt, M; Alfonso, JE; Rodriguez-Castellon, E; Romero, E
Article.
Metall. Mater. Trans. A-Phys. Metall. Mater. Sci.. vol: 49A. page: 1073-5623.
Date: NOV. 2018.
Doi: 10.1007/s11661-018-4888-5.
Abstract:
New ZrOxNy thin films were deposited via reactive RF magnetron sputtering on stainless steel substrate from a Y2O3-doped ZrO2 (3YSZ) target. In order to reduce their porosity and increase corrosion resistance, the films were annealed at 265 degrees C in an inert atmosphere at reduced pressure, increasing their density and corrosion resistance in saline solution. The crystal structure of the films was characterized by means of X-ray diffraction, the morphology via scanning electron microscopy and atomic force microscopy, and the chemical composition via X-ray photoelectron spectroscopy. The corrosion resistance was evaluated using electrochemical techniques based on linear polarization. The results show that the annealing treatment decreases the morphological imperfections of the coatings such as pores and cracks, which allows increasing the corrosion resistance of the substrate-coating system. (C) The Minerals, Metals & Materials Society and ASM International 2018.